Mott insulator Aryl-diazonium salts Chemical detection A Thin films Amorphous Films Mott insulators Applications industrielles Selenization Carbon nitride B2 Quaternary A1 Characterization Alzheimer's disease Plasma etching Physical vapor deposition Chalcogenides Atomic force microscopy A3 Physical vapor deposition processes Sol-gel A-CNx TiO2 Oxides Ablation laser Buffer Couple X-ray photoelectron spectroscopy C Photoelectron spectroscopy Copper Carbon nanotubes Atomic layer etching AZO thin films Transfert d'énergie Bipolar resistive switching BRS Thin films Sputtering Plasmas froids Etching Semiconductors Nanocomposite Residual stress Band alignment Amyloid precursor Optical properties B Chemical synthesis NEXAFS Chalcogenide glass Non-volatile memory Alloying TEM A Chalcogenides Thin film Structure BOMBARDMENT B1 Inorganic compounds Cathepsin Ambipolar material Resistive switching Biocapteurs Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Biomasse Carbon Nanotube AuCu alloy CaTiO3Pr^3^+ Bixbyite V2O3 Aluminium nitride Adsorption CNTs’ collapse Calcined clay CH4 B2 Semiconducting alloys Functionalization AlN Nanotubes SF 6 Capacitance XPS B2 Semiconducting indium compounds Kirkendall effect CHLORINE PLASMAS X-ray diffraction Biofilms microbiens Colloidal solution B3 Solar cells Chemical and biological sensors Band gap CIGSe Anatase Avalanche breakdown Transmission electron microscopy Chalcogenide Titanium dioxide PECVD A Multilayers Spectroscopic ellipsometry 3 nm in size Magnetron sputtering Carbon Low-pressure plasma processing Vanadium Sesquioxide Scanning electron microscopy