Kirkendall effect Carbon C Photoelectron spectroscopy A1 Characterization NEXAFS 3 nm in size A Multilayers Alzheimer's disease Films A-CNx Transmission electron microscopy Thin film Ambipolar material AuCu alloy Applications industrielles Plasma etching B Chemical synthesis CNTs’ collapse Bipolar resistive switching BRS Residual stress Chalcogenide glass B2 Semiconducting indium compounds XPS Spectroscopic ellipsometry CIGSe Aluminium nitride Low-pressure plasma processing SF 6 Band gap Oxides Semiconductors Mott insulator Plasmas froids X-ray diffraction Carbon Nanotube A Chalcogenides Atomic force microscopy CH4 Scanning electron microscopy Nanotubes Band alignment Sol-gel Aryl-diazonium salts BOMBARDMENT Vanadium Sesquioxide Transfert d'énergie Alloying Carbon nitride V2O3 TiO2 Chemical detection Chemical and biological sensors Carbon nanotubes Non-volatile memory B3 Solar cells AZO thin films Chalcogenides Buffer Couple Optical properties Amorphous Chalcogenide Copper Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Anatase Physical vapor deposition B2 Semiconducting alloys Ablation laser CaTiO3Pr^3^+ Biocapteurs A Thin films Amyloid precursor Mott insulators Sputtering Magnetron sputtering Cathepsin CHLORINE PLASMAS Titanium dioxide Thin films Atomic layer etching Structure Nanocomposite Colloidal solution A3 Physical vapor deposition processes Biomasse Avalanche breakdown Adsorption PECVD Calcined clay B2 Quaternary Functionalization TEM Etching Selenization Biofilms microbiens AlN Bixbyite Capacitance X-ray photoelectron spectroscopy Resistive switching B1 Inorganic compounds