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Modeling Halo Implant Failures in MOS Sub-Micron Technology

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https://hal-lirmm.ccsd.cnrs.fr/lirmm-00106513
Contributor : Christine Carvalho De Matos Connect in order to contact the contributor
Submitted on : Monday, October 16, 2006 - 8:38:39 AM
Last modification on : Friday, August 5, 2022 - 10:48:09 AM

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  • HAL Id : lirmm-00106513, version 1

Citation

Arnaud Regnier, Jean-Michel Portal, Rachid Bouchakour, Michel Renovell. Modeling Halo Implant Failures in MOS Sub-Micron Technology. LATW: Latin American Test Workshop, Mar 2005, Salvador, Bahia, Brazil. pp.29-33. ⟨lirmm-00106513⟩

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