Low Current Application Dedicated Process Characterization Method - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier
Conference Papers Year : 2002

Low Current Application Dedicated Process Characterization Method

Christine Carvalho De Matos  : Connect in order to contact the contributor

https://hal-lirmm.ccsd.cnrs.fr/lirmm-00268523

Submitted on : Tuesday, April 1, 2008-9:27:39 AM

Last modification on : Friday, March 24, 2023-2:52:50 PM

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lirmm-00268523 , version 1 (01-04-2008)

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  • HAL Id : lirmm-00268523 , version 1

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Wenceslas Rahajandraibe, Christian Dufaza, Daniel Auvergne, Bruno Cialdella, Bernard Majoux, et al.. Low Current Application Dedicated Process Characterization Method. ICMTS'02: International Conference on Microelectronic Test Structures, Cork, Ireland, pp.41-44. ⟨lirmm-00268523⟩

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