A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier
Conference Papers Year : 2011

A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology

Domains

Micro and nanotechnologies/Microelectronics

Martine Peridier  : Connect in order to contact the contributor

https://hal-lirmm.ccsd.cnrs.fr/lirmm-00647750

Submitted on : Friday, December 2, 2011-3:43:37 PM

Last modification on : Friday, March 24, 2023-2:52:55 PM

No file

Dates and versions

lirmm-00647750 , version 1 (02-12-2011)

Identifiers

  • HAL Id : lirmm-00647750 , version 1

Cite

Pierre-Didier Mauroux, Arnaud Virazel, Alberto Bosio, Luigi Dilillo, Patrick Girard, et al.. A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology. DTIS: Design and Technology of Integrated Systems in Nanoscale Era, 2011, Athènes, Greece. ⟨lirmm-00647750⟩

Export

BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite

Collections

CNRS SYSMIC LIRMM LIRMM_MIC MIC MIPS UNIV-MONTPELLIER EC_LYON_STRICT
112 View
0 Download

Share

More