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Conference Papers Year : 2019

Importance of Interconnects: A Technology-System-Level Design Perspective

Jie Liang
  • Function : Author
  • PersonId : 971767
Aida Todri-Sanial

Abstract

Current technology-design optimization methodology focuses first on front-end devices and logic gates and then addresses back-end interconnects. But, such approach is no longer feasible for sub-nanometer technologies. Here, we present a circuit-level study where both devices and interconnects are co-optimized to improve energy efficiency. We investigate advanced CMOS technology with 7 nm FinFET devices, and Cu interconnects with various aspect ratios from 3, 5 to 10. Further, we explore the advantages of carbon nanotube (CNT) based circuits with CNT field-effect devices and interconnects. CNT technology can achieve better energy-delay-product with co-exploring front- and back-end co-optimization and paving the way for an intelligent circuit-/system-level design and technology co-optimization.
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Dates and versions

lirmm-02388007 , version 1 (12-12-2019)

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Jie Liang, Aida Todri-Sanial. Importance of Interconnects: A Technology-System-Level Design Perspective. IEDM 2019 - 65th IEEE International Electron Device Meeting, Dec 2019, San Francisco, United States. pp.23.1.1-23.1.4, ⟨10.1109/IEDM19573.2019.8993558⟩. ⟨lirmm-02388007⟩
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