Low Current Application Dedicated Process Characterization Method - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier Access content directly
Conference Papers Year : 2002
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lirmm-00268523 , version 1 (01-04-2008)

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  • HAL Id : lirmm-00268523 , version 1

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Wenceslas Rahajandraibe, Christian Dufaza, Daniel Auvergne, Bruno Cialdella, Bernard Majoux, et al.. Low Current Application Dedicated Process Characterization Method. ICMTS'02: International Conference on Microelectronic Test Structures, Cork, Ireland, pp.41-44. ⟨lirmm-00268523⟩
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