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Conference papers

Low Current Application Dedicated Process Characterization Method

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https://hal-lirmm.ccsd.cnrs.fr/lirmm-00268523
Contributor : Christine Carvalho De Matos Connect in order to contact the contributor
Submitted on : Tuesday, April 1, 2008 - 9:27:39 AM
Last modification on : Friday, August 5, 2022 - 10:32:01 AM

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  • HAL Id : lirmm-00268523, version 1

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Wenceslas Rahajandraibe, Christian Dufaza, Daniel Auvergne, Bruno Cialdella, Bernard Majoux, et al.. Low Current Application Dedicated Process Characterization Method. ICMTS'02: International Conference on Microelectronic Test Structures, Cork, Ireland, pp.41-44. ⟨lirmm-00268523⟩

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