On-Chip Process Variability Monitoring

Abstract : The management of the process induced variability, which is a matter of a few atoms or less, while warranting integrated circuit's functionality is now one of the major challenges in integrated system design. The fluctuation of key process parameters such as gate length, oxide thickness, threshold voltage, in addition to the variability related to local transistor environment and wires including circuit layout, pattern dependency and density appears as an important additional issue and technological solutions can no longer compensate for all the effects of scaling. Up to now, this increasing variability has led designers to introduce additional design margins which increases pessimism and thus reduces both timing and power performances. Within this context, to overcome the variability issue, good process control techniques combined with on-chip performance monitoring and compensation techniques appears as an interesting solution. This poster will present the integration of on-chip process sensors to ease the tracking over fab-to-fab, wafer-to-wafer and die-to-die variability, and also ease the implementation of diagnosis methodologies and process learning which resumes in closing the loop between system design and technology development
Type de document :
Communication dans un congrès
DATE: Design, Automation and Test in Europe, Apr 2009, Nice, France. 2009, W2
Liste complète des métadonnées

https://hal-lirmm.ccsd.cnrs.fr/lirmm-00374368
Contributeur : Nadine Azemard <>
Soumis le : mercredi 8 avril 2009 - 14:07:04
Dernière modification le : mercredi 7 mars 2018 - 11:56:02

Identifiants

  • HAL Id : lirmm-00374368, version 1

Collections

Citation

Nabila Moubdi, Robin Wilson, Sylvain Engels, Nadine Azemard, Philippe Maurine. On-Chip Process Variability Monitoring. DATE: Design, Automation and Test in Europe, Apr 2009, Nice, France. 2009, W2. 〈lirmm-00374368〉

Partager

Métriques

Consultations de la notice

69