SoC Yield Improvement for Future Nanoscale Technologies - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier Accéder directement au contenu
Poster De Conférence Année : 2009

SoC Yield Improvement for Future Nanoscale Technologies

Résumé

Manufacturing processes in the nanoscale era are less and less reliable thus leading to lower and lower yield. In this paper we investigate the usage of TMR (Triple Modular Redundancy), a fault tolerant architecture, for logic cores to increase their manufacturing yield and thus raise the overall SoC yield.
Fichier non déposé

Dates et versions

lirmm-00433798 , version 1 (20-11-2009)

Identifiants

  • HAL Id : lirmm-00433798 , version 1

Citer

Julien Vial, Arnaud Virazel, Alberto Bosio, Luigi Dilillo, Patrick Girard, et al.. SoC Yield Improvement for Future Nanoscale Technologies. ETS 2009 - 14th IEEE European Test Symposium | PhD Forum, May 2009, Sevilla, Spain. 2009. ⟨lirmm-00433798⟩
66 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More