Benefit on Interconnect Performance of a Relaxed Wire Density in a 45 nm Node of the Back End of Line - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier Access content directly
Conference Papers Year : 2010
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lirmm-00485629 , version 1 (21-05-2010)

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  • HAL Id : lirmm-00485629 , version 1

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Sébastien de Rivaz, Alexis Farcy, Denis Deschacht, Thierry Lacrevaz, Bernard Flechet. Benefit on Interconnect Performance of a Relaxed Wire Density in a 45 nm Node of the Back End of Line. IEEE 14th Workshop on Signal Propagation on Interconnects, Germany. pp.9. ⟨lirmm-00485629⟩
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