A Non-Split Model for Realistic Gate Oxide Short in CMOS Technology - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier Access content directly
Conference Papers Year : 2002

A Non-Split Model for Realistic Gate Oxide Short in CMOS Technology

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lirmm-00268432 , version 1 (01-04-2008)

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  • HAL Id : lirmm-00268432 , version 1

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Michel Renovell, Jean-Marc J.-M. Galliere, Florence Azaïs, Yves Bertrand. A Non-Split Model for Realistic Gate Oxide Short in CMOS Technology. DCIS: Design of Circuits and Integrated Systems, 2002, Santander, Spain. pp.197-204. ⟨lirmm-00268432⟩
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