Impact of Low-K Intra-Layer Dielectrics on Integration

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Conference papers
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https://hal-lirmm.ccsd.cnrs.fr/lirmm-00268501
Contributor : Christine Carvalho de Matos <>
Submitted on : Tuesday, April 1, 2008 - 9:27:33 AM
Last modification on : Thursday, October 17, 2019 - 12:34:55 PM

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  • HAL Id : lirmm-00268501, version 1

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Denis Deschacht, Fabrice Huret. Impact of Low-K Intra-Layer Dielectrics on Integration. 9th IEEE Workshop on Signal Propagation on Interconnects, Pisa, Italy. pp.181-184. ⟨lirmm-00268501⟩

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