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A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology

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https://hal-lirmm.ccsd.cnrs.fr/lirmm-00647750
Contributor : Martine Peridier <>
Submitted on : Friday, December 2, 2011 - 3:43:37 PM
Last modification on : Friday, November 27, 2020 - 6:04:03 PM

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  • HAL Id : lirmm-00647750, version 1

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Pierre-Didier Mauroux, Arnaud Virazel, Alberto Bosio, Luigi Dilillo, Patrick Girard, et al.. A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology. DTIS: Design and Technology of Integrated Systems in Nanoscale Era, 2011, Athènes, Greece. ⟨lirmm-00647750⟩

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