A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier Access content directly
Conference Papers Year : 2011

A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology

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Micro and nanotechnologies/Microelectronics

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https://hal-lirmm.ccsd.cnrs.fr/lirmm-00647750

Submitted on : Friday, December 2, 2011-3:43:37 PM

Last modification on : Friday, March 24, 2023-2:52:55 PM

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lirmm-00647750 , version 1 (02-12-2011)

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  • HAL Id : lirmm-00647750 , version 1

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Pierre-Didier Mauroux, Arnaud Virazel, Alberto Bosio, Luigi Dilillo, Patrick Girard, et al.. A DfT Solution for Oxide Thickness Varitions in ATMEL eFlash Technology. DTIS: Design and Technology of Integrated Systems in Nanoscale Era, 2011, Athènes, Greece. ⟨lirmm-00647750⟩

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