Statistical Energy Study for 28nm FDSOI Technology

Kheirallah Rida 1 Gilles Ducharme 2 Nadine Azemard 1
1 SysMIC - Conception et Test de Systèmes MICroélectroniques
LIRMM - Laboratoire d'Informatique de Robotique et de Microélectronique de Montpellier
2 EPS - Probabilités et statistiques
I3M - Institut de Mathématiques et de Modélisation de Montpellier
Abstract : Due to the effects of the Moore’s law, the process variations in current technologies are increasing and have a major impact on power and performance which results in parametric yield loss. Due to this, process variability and the difficulty of modeling accurately transistor behavior impede the dimensions scaling benefits. The Fully Depleted Silicon-On-Insulator (FDSOI) technology is one of the main contenders for deep submicron devices as they can operate at low voltage with superior energy efficiency compared with bulk CMOS. In this paper, we study the static energy on 28nm FDSOI devices to implement sub-threshold circuits. Study of delay vs. static power trade-off reveals the FDSOI robustness with respect to process variations.
Type de document :
Communication dans un congrès
VARI: Workshop on CMOS Variability, Sep 2015, Salvador, Bahia, Brazil. 2015, 6th International Workshop on CMOS Variability. 〈http://www.inf.ufrgs.br/vari/〉
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https://hal-lirmm.ccsd.cnrs.fr/lirmm-01256280
Contributeur : Nadine Azemard <>
Soumis le : jeudi 14 janvier 2016 - 15:43:19
Dernière modification le : lundi 16 juillet 2018 - 11:08:13

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  • HAL Id : lirmm-01256280, version 1

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Kheirallah Rida, Gilles Ducharme, Nadine Azemard. Statistical Energy Study for 28nm FDSOI Technology. VARI: Workshop on CMOS Variability, Sep 2015, Salvador, Bahia, Brazil. 2015, 6th International Workshop on CMOS Variability. 〈http://www.inf.ufrgs.br/vari/〉. 〈lirmm-01256280〉

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