Additivity of Capacitive and Inductive Coupling in Submicronic Interconnects - LIRMM - Laboratoire d’Informatique, de Robotique et de Microélectronique de Montpellier
Conference Papers Year : 2006

Additivity of Capacitive and Inductive Coupling in Submicronic Interconnects

Abstract

Constant evolution in integrated circuit technology has led to an increase in the switching speed of the digital chip. As a result, there is a growing interest in the inductance associated with signal lines. Inductive coupling effects on interconnects is an emerging concern in high performance digital integrated circuits. Based on an RLC transmission line model, associated to each propagation mode, a new crosstalk noise model is proposed to evaluate both the capacitive and the inductive coupling. The additivity of the coupling is shown and validated with several simulations.
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Dates and versions

lirmm-00093341 , version 1 (13-09-2006)

Identifiers

  • HAL Id : lirmm-00093341 , version 1

Cite

Jean-Etienne Lorival, Denis Deschacht, Yves Quéré, Thierry Le Gouguec, Fabrice Huret. Additivity of Capacitive and Inductive Coupling in Submicronic Interconnects. DTIS: Design and Technology of Integrated Systems in Nanoscale Era, Sep 2006, Tunis, Tunisia. pp.300-304. ⟨lirmm-00093341⟩
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